Ta_XRD
Cryogenic Growth of Superconductors
We are investigating the fundamental mechanisms of thin-film growth at cryogenic temperatures using low-temperature molecular beam epitaxy (LT-MBE). By cooling substrates to temperatures as low as ~ 5 K, we drastically suppress surface and bulk diffusion—effectively freezing out the kinetic processes that typically drive conventional film growth. This kinetic limitation opens the door to minimize interfacial reactions to create atomically abrupt interfaces, preventing agglomeration or dewetting. It also enables the stabilization of metastable phases that may exhibit novel structural or electronic properties not accessible at higher temperatures.
Relevant Publications
Cryogenic growth of tantalum thin films for low-loss superconducting circuits
